Editor in Chief

• Vayssieres, Lionel, Xi'an Jiaotong University, China and Lawrence Berkeley National Laboratory, USA
  (ijntlbl.gov)

Associate Editor

• Mao, Samuel S., University of California at Berkeley, USA

Editorial Board Members

• Bando, Yoshio, National Institute for Materials Science, Japan
• Beye, Aboubakar Chedikh, University of Cheikh Anta-Diop of Dakar, Senegal
• Burda, Clemens, Case Western Reserve University, USA
• Chorkendorff, Ib, Technical University of Denmark, Denmark
• De Battisti, Achille, The University of Ferrara, Italy
• Gabriel, Jean-Christophe P., CEA Léti - MINATEC, France
• Graetzel, Michael, Ecole Polytechnique Fédéral de Lausanne (EPFL), Switzerland
• Guo, Jinghua, Lawrence Berkeley National Laboratory, USA
• Hagfeldt, Anders, Royal Institute of Technology (KTH), Sweden
• Hocheng, Hong, National Tsing Hua University, Taiwan
• Hou, Jian-Guo, Hefei University of Science and Technology, China
• Huck, Wilhelm T.S., Cambridge University, UK
• Hui, David, University of New Orleans, USA
• Hyeon, TaeghWan, Seoul National University, South Korea
• Kebede, Zerihun, Kotebe College of Teacher Education, Ethiopia
• Kotov, Nicholas A., University of Michigan, USA
• Levy-Clement, Claude, CNRS-UMR 7182, France
• Lin, Yuehe, Pacific Northwest National Laboratory, USA
• Lu, Max, The University of Queensland, Australia
• Maaza, Malik, iThemba Labs, South Africa
• Maier, Wilhelm F., University of the Saarland, Germany
• Mathur, Sanjay, University of Cologne, Germany
• Moszner, Norbert, Ivoclar Vivadent AG, Liechtenstein
• Rosei, Federico, Universite du Quebec, Canada
• Sanderson, Ron, The University of Stellenbosch, South Africa
• Seeman, Nadrian C., New York University, USA
• Serena, Pedro A., Instituto de Ciencia de Materiales de Madrid, Spain
• Shi, Li, The University of Texas at Austin, USA
• Sun, Xiaowei, Shenzhen South University of Science and Technology, China
• Swider-Lyons, Karen, Naval Research Laboratory, USA
• Travas-Sejdic, Jadranka, The University of Auckland, New Zealand
• Waychunas, Glenn A., Lawrence Berkeley National Laboratory, USA
• Westin, Gunnar, Uppsala University, Sweden
• Willner, Itamar, The Hebrew University of Jerusalem, Israel
• Worms, Jean-Claude, European Science Foundation, France
• Xia, Younan, Georgia Institute of Technology, USA
• Yanagida, Shozo, Osaka University, Japan
• Yang, Shihe, Hong Kong University of Science and Technology, Hong Kong SAR, China
• Zhang, John, Georgia Institute of Technology, USA

A few essentials for publishing in this journal

• Submitted articles should not have been previously published or be currently under consideration for publication elsewhere.
• Conference papers may only be submitted if the paper has been completely re-written (more details available here) and the author has cleared any necessary permissions with the copyright owner if it has been previously copyrighted.
• Briefs and research notes are not published in this journal.
• All our articles go through a double-blind review process.
• All authors must declare they have read and agreed to the content of the submitted article. A full statement of our Ethical Guidelines for Authors (PDF) is available.
• There are no charges for publishing with Inderscience, unless you require your article to be Open Access (OA). You can find more information on OA here.

Submission process

• Articles for IJNT are by invitation only. Authors should not try to submit unless invited.