Effect of sputtering power on nano-mechanical properties of ZnO film Online publication date: Thu, 07-Apr-2016
by Miao Zhang; Ningbo Liao; Pengfei Chen; Wei Xue
International Journal of Materials and Structural Integrity (IJMSI), Vol. 9, No. 4, 2015
Abstract: In this study, unbalanced magnetron sputtering approach was used to prepare ZnO film by using high-purity ZnO target. Nano-indentation and scratch test were used to study the mechanical properties of ZnO film at different sputtering powers. According to the experimental results, optimums of Young's modulus, surface roughness and adhesion strength are present at an optimal sputtering power.
Online publication date: Thu, 07-Apr-2016
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