Title: Effect of sputtering power on nano-mechanical properties of ZnO film

Authors: Miao Zhang; Ningbo Liao; Pengfei Chen; Wei Xue

Addresses: Jiangsu University, 301 Xuefu Rd, Jingkou, Zhenjiang, Jiangsu, China ' School of Mechanical and Electrical Engineering, Wenzhou University, Wenzhou 325000, China ' School of Mechanical and Electrical Engineering, Wenzhou University, Wenzhou 325000, China ' School of Mechanical and Electrical Engineering, Wenzhou University, Wenzhou 325000, China

Abstract: In this study, unbalanced magnetron sputtering approach was used to prepare ZnO film by using high-purity ZnO target. Nano-indentation and scratch test were used to study the mechanical properties of ZnO film at different sputtering powers. According to the experimental results, optimums of Young's modulus, surface roughness and adhesion strength are present at an optimal sputtering power.

Keywords: ZnO film; zinc oxide; magnetron sputtering; mechanical properties; binding force; scratch tests; nanoindentation; nanotechnology; Young's modulus; surface quality; surface roughness; adhesion strength.

DOI: 10.1504/IJMSI.2015.075829

International Journal of Materials and Structural Integrity, 2015 Vol.9 No.4, pp.236 - 243

Available online: 07 Apr 2016 *

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