Title: Methods of nanostructured coatings deposition by magnetron sputtering and cathodic arc evaporation

Authors: V.N. Pashentsev

Addresses: Department of Electrical Engineering, National Research Nuclear University MEPhI, 31, Kashirskoe Shosse, Moscow, 115409, Russia

Abstract: Nanoscale coatings improve hardness, corrosion resistance and wear resistance of the cutting tools and machine parts. The sputtering magnetrons and the cathodic arc evaporators are used in industrial and medical applications to produce functional and protective films. PVD methods of nanostructured coating deposition based on limitation of crystal growth are described in this article. Three methods are applied for this purpose. Metal cathodes containing 3%-12% additives such as Si, B, BN, Cu, Ni are used to limit the crystal growth in the nanoscale range. The substrate rotation leads to the reduction of the layer thickness to obtain the multilayer nanoscale coatings. Bias voltage applied to the substrate holder for the ion bombardment and the substrate heating can be used to reduce the crystal size in the coating. The design of the vacuum set with plasma sources and ion beam source is considered.

Keywords: film deposition; cathodic arc evaporation; CAE; electron beam evaporation; nanostructured coating; nanoscale coatings; nanocomposites; nanotechnology; nanostructured coatings; magnetron sputtering; crystal growth; layer thickness; crystal size.

DOI: 10.1504/IJSURFSE.2017.082950

International Journal of Surface Science and Engineering, 2017 Vol.11 No.1, pp.36 - 44

Received: 18 Sep 2015
Accepted: 05 Mar 2016
Published online: 16 Mar 2017 *

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