Authors: İ. Afşin Kariper
Addresses: Education Faculty, Erciyes University, 38039, Kayseri, Turkey
Abstract: During this study, uranium oxide thin film is deposited by chemical bath deposition method. The structure of the films is analysed by far-infrared spectrum, X-ray diffraction. The average grain size is determined to be 22.93 nm. The film thickness is measured with atomic force microscopy, at 280 nm. The optical properties are researched through ultraviolet-visible spectroscopic technique. Well-known optical properties of uranium oxide thin film are compared with the related data in literature and unknown optical properties of uranium oxide thin film are researched. The transmittance is found to be 83.75% at 550 nm wavelengths and the refractive index is found to be 1.56 at 550 nm wavelengths. The uranium oxide thin film was a transparent thin film. The optical band gap of the uranium oxide thin film is graphically estimated to be 1.45 eV. The surface tension of uranium oxide thin film is calculated to be 33.33 mN/m.
Keywords: thin films; crystal growth; optical properties; surface tension; structural properties; uranium oxide; grain size; film thickness.
International Journal of Surface Science and Engineering, 2016 Vol.10 No.5, pp.432 - 443
Received: 26 Dec 2014
Accepted: 11 Jul 2015
Published online: 10 Sep 2016 *