Authors: Xiaoguo Feng
Addresses: Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics and Fine Mechanics and Physics, Chinese Academy of Science, Dong Nanhu Road 3888, Changchun, Jilin, China
Abstract: To fabricate an inductive mesh film with a micron grade line width on a concave spherical substrate, we put forward a laser direct writing method of concentric optical scan, and it means that the intersecting point of three kinematic axes and an optical axis is the curvature centre of concavity. The specific scanning way is separated into four steps. Firstly, a concave spherical substrate of coating photoresist is installed erectly on a horizontal shafting, and a laser beam is focused on the edge of photoresist surface. Afterward, the substrate and horizontal shafting rotate as a whole with the rotary of an erect shafting, a line is written on the photoresist surface while a rotation period is accomplished. Then, the laser beam is turned an angle at the pitching direction, and the substrate is rotated again a cycle, so another line is written. Repeating this way, we get a set of latitude lines. Finally, the substrate makes a quarter turn around the horizontal axis, and repeating preceding processes, we get a mesh figure of intersecting latitude lines. In the experiment part, we fabricate an inductive mesh film with a period 600 μm and a line width 7 μm on a concave spherical substrate.
Keywords: microstructure fabrication; photolithography; transparent conductive film; inductive mesh film; spherical substrate; laser direct writing; concentric optical scanning; coating photoresist.
International Journal of Nanotechnology, 2015 Vol.12 No.10/11/12, pp.868 - 875
Published online: 18 Sep 2015 *Full-text access for editors Access for subscribers Purchase this article Comment on this article