Title: Selection of metrology and manufacturing process for a functional surface

Authors: S.K. Ramasamy; J. Raja; H. Peruru

Addresses: Department of Mechanical Engineering & Engineering Sciences, University of North Carolina at Charlotte, Charlotte, NC 28223, USA ' Department of Mechanical Engineering & Engineering Sciences, University of North Carolina at Charlotte, Charlotte, NC 28223, USA ' Department of Mechanical Engineering & Engineering Sciences, University of North Carolina at Charlotte, Charlotte, NC 28223, USA

Abstract: With the rapid evolution of new engineered surfaces, there is a strong need for developing strategies for selection of right manufacturing and metrology tools, in order to manufacture and measure/characterise these surfaces at different scales. Recent technology trends like miniaturisation and multi-scale modelling have further increased the need to better understand manufacturing and metrology equipments to provide functional surfaces. Amplitude-wavelength (AW) diagrams have been used to characterise instruments and processes in a common domain. Typically AW diagrams are generated assuming that within the limiting lines, the capability of the system is uniform. But various studies have revealed non-linearity in the capabilities, which can be included in the AW diagrams using a third axis and developing 3D AW diagrams. This paper discusses the proposed methodology to develop 3D AW diagrams for measurement systems, using instrument transfer function (ITF) as a main contributor to system capability.

Keywords: functional engineered surfaces; amplitude-wavelength diagrams; AW maps; ITF; instrument transfer function; surface metrology; manufacturing processes; process selection; functional surfaces; system capability.

DOI: 10.1504/IJPTECH.2013.057056

International Journal of Precision Technology, 2013 Vol.3 No.3, pp.303 - 313

Available online: 06 Oct 2013 *

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