Title: Key indicators to monitor and benchmark R&D activities in China: a comparative empirical and literature analysis
Authors: Markus Helfenstein, Martin Steinert
Addresses: Faculty of Economics and Social Sciences, University of Fribourg, Boulevard de Perolles, 90, CH-1700 Fribourg, Switzerland. ' Faculty of Economics and Social Sciences, University of Fribourg, Boulevard de Perolles, 90, CH-1700 Fribourg, Switzerland
Abstract: This paper elaborates a set of specific key R&D indicators (KR&DI) for companies conducting R&D in China. Its data foundation consists of two empirical surveys on NXP semiconductors Business Baseband|s R&D programme in China, on internal NXP documents and information, on interviews with non-NXP expatriates, and on a thorough literature analysis, comparing other studies on the subject with the NXP surveys. The resulting KR&DI span the specific R&D dimensions of (1) soft aspects such as political, economical, cultural, risk and technology aspects, (2) strategy aspects including Communication, (3) R&D activities including knowledge transfer, location choice, entry motives and know-how protection, (4) IP rights and ethics and (5) HR and managerial aspects. Due to their form as cards, closely modelled on the European Foundation for Quality Management (EFQM) toolbox format, the indicators can easily be adapted and deployed by other companies involved in Chinese R&D.
Keywords: research and development; business intelligence; KR&DI; key indicators; R&D indicators; EFQM toolbox cards; China; NXP; benchmarking; semiconductor industry.
International Journal of Technology, Policy and Management, 2010 Vol.10 No.3, pp.258 - 283
Published online: 06 Aug 2010 *Full-text access for editors Access for subscribers Purchase this article Comment on this article