Title: Preparation and characterisation of carbon nitride films deposited by pulsed laser arc deposition

Authors: L. Yin, T.M. Shao, S.B. Wei, Y.Q. Zhou

Addresses: State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China. ' State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China. ' State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China. ' State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China

Abstract: Carbon nitride (CNx) films were prepared on silicon substrates by pulsed laser arc deposition with different working gases and various gas pressures. The bonding structure and the chemical compositions of the resulting CNx films were studied by AES, Raman spectroscope and XPS, respectively. The results showed that the average nitrogen content varied between 9% and 28%, and masses of sp² C–N bond and sp³ C–N bond formed in the CNx films. The nanohardness decreased from 30 GPa to 6 GPa, whereas the friction coefficient increased with increasing nitrogen content in the resulting CNx films.

Keywords: carbon nitride films; pulsed laser arc deposition; nanohardness; friction coefficient; bonding structure; chemical composition; nitrogen content.

DOI: 10.1504/IJSURFSE.2010.033252

International Journal of Surface Science and Engineering, 2010 Vol.4 No.3, pp.250 - 257

Available online: 14 May 2010 *

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