Title: Review of MEMS metrology solutions

Authors: James F. Nichols, Meghan Shilling, Thomas R. Kurfess

Addresses: Applied Research Associates, 8540 Colonnade Center Drive, Ste 301, Raleigh, NC 27615, USA. ' Sandia National Laboratory, P.O. Box 5800, MS 0665, Albuquerque, NM 87185-0665, USA. ' Department of Mechanical Engineering, Carroll A. Campbell Jr. Graduate Engineering Center, International Center for Automotive Research, Clemson University, 244 Fluor Daniel Building, Clemson, SC 29634-0921, USA

Abstract: This paper serves as a review of current solutions for MEMS metrology. This survey provides an extensive and in-depth review of the current tools and their fundamental limitations. Techniques that are reviewed include tools that are extensions of semiconductor tools, scaled down versions of conventional metrology tools and entirely novel methods for MEMS inspection.

Keywords: MEMS metrology; microfabrication; SEM; scanning electron microscopy; interferometry; micro-CMMs; coordinate measuring machines; microelectromechanical systems; microengineering; MEMS inspection.

DOI: 10.1504/IJMTM.2008.016781

International Journal of Manufacturing Technology and Management, 2008 Vol.13 No.2/3/4, pp.344 - 359

Published online: 22 Jan 2008 *

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