Int. J. of Nanomanufacturing   »   2013 Vol.9, No.5/6

 

 

Title: Nanoscale structures for implementation of anti-reflection and self-cleaning functions

 

Authors: Zuobin Wang; Jin Zhang; Lingxia Hang; Shilei Jiang; Guoqiang Liu; Ze Ji; Chunlei Tan; Huan Sun

 

Addresses:
CNM and IJRCNB Centers, Changchun University of Science and Technology, 7089 Weixing Road, Changchun, Jilin, 130022, China
Shaanxi Province Key Lab of Thin Films Technology and Optical Test, Xi'an Technological University, 4 Jinhua North Road, Xi'an, Shaanxi, 710032, China
Shaanxi Province Key Lab of Thin Films Technology and Optical Test, Xi'an Technological University, 4 Jinhua North Road, Xi'an, Shaanxi, 710032, China
Shaanxi Province Key Lab of Thin Films Technology and Optical Test, Xi'an Technological University, 4 Jinhua North Road, Xi'an, Shaanxi, 710032, China
Chengdu Green Energy and Green Manufacturing Tech. R&D Center, 355 Tengfei Er Road, The Southwest Airport Economic Development Zone, Shuangliu, Chengdu, Sichuan, 100084, China
School of Engineering, Cardiff University, Queen's Buildings, The Parade, Cardiff, CF24 3AA, UK
Optoelectronics Research Centre, Tampere University of Technology, P.O. Box 692, FIN-33101, Tampere, Finland
Shaanxi Province Key Lab of Thin Films Technology and Optical Test, Xi'an Technological University, 4 Jinhua North Road, Xi'an, Shaanxi, 710032, China

 

Abstract: Well-designed optical sub-wavelength surface relief structures could be used for minimising the reflection losses at the surface, and be used to increase the hydrophobic property of the surface, so that to improve the efficiencies and reduce the maintaining costs of solar cells. Interference lithography technology provides a way to fabricate a fine surface structure with the periods that are much shorter than the wavelengths of near infrared or visible light. The morphology of the microstructure by multi-beam interference lithography can be controlled, allowing the design of sub-wavelength structure surfaces with both anti-reflection (AR) and self-cleaning functions. In this paper, the analysis of the anti-reflection sub-wavelength relief structure and the self-cleaning relief structure is given, and the realisation method for a multi-functional structure using the interference lithography technology is presented.

 

Keywords: self-cleaning; interference lithography; hydrophobic properties; anti-reflection; reflection losses; solar cells; microstructure; optical sub-wavelength structure surfaces.

 

DOI: 10.1504/IJNM.2013.057596

 

Int. J. of Nanomanufacturing, 2013 Vol.9, No.5/6, pp.520 - 531

 

Date of acceptance: 28 Feb 2013
Available online: 13 Nov 2013

 

 

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