Title: Preparation of porous alumina-titania abrasive and its chemical mechanical polishing behaviour on hard disk substrate

Authors: Naijing Bu; Hong Lei

Addresses: Research Center of Nano-science and Nano-technology, Shanghai University, Shanghai 200444, China. ' Research Center of Nano-science and Nano-technology, Shanghai University, Shanghai 200444, China

Abstract: Porous alumina-titania abrasive was prepared via cooperative self-assembly of titanium (IV) isopropoxide and aluminum isopropoxide in the presence of a soft template by the sol-gel method. The resulting abrasive was characterised by energy dispersive spectrometer (EDS), transmission electron microscope (TEM) and nitrogen adsorption analyses. Then the chemical mechanical polishing (CMP) behaviours of the as-prepared porous alumina-titania abrasive on hard disk substrate were investigated. The CMP test results showed that the surface polished by the slurry containing the porous alumina-titania abrasive exhibited lower surface average roughness (Ra), less scratch as well as lower topographical variations than those by the slurry containing the solid alumina abrasive at the same conditions.

Keywords: porous alumina-titania abrasive; chemical mechanical polishing; CMP; hard disk substrate; average roughness; self-assembly; titanium isopropoxide; aluminum isopropoxide; sol-gel; surface roughness; surface quality.

DOI: 10.1504/IJAT.2012.048536

International Journal of Abrasive Technology, 2012 Vol.5 No.2, pp.119 - 127

Received: 14 Nov 2011
Accepted: 21 Feb 2012
Published online: 30 Jul 2014 *

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