Force nanolithography on various surfaces by atomic force microscope Online publication date: Fri, 02-Jul-2010
by S. Sadegh Hassani, Z. Sobat, H.R. Aghabozorg
International Journal of Nanomanufacturing (IJNM), Vol. 5, No. 3/4, 2010
Abstract: The atomic force microscope (AFM) has become an increasing popular tool for characterising and manipulating surfaces and thin films of many different types of materials. In this work, nanolithography on surface of different substrates was studied by AFM. The scratches on poly methyl methacrylate (PMMA) coated on silicon and glass, highly-oriented pyrolytic graphite (HOPG) and polyethylene (PE) were made using contact mode and silicon and diamond tips. The normal force between the tips and the desired samples was estimated from cantilever deflection curve plotted against Z-displacement of the cantilever. This curve was converted to force-distance curve by using Hook's law. Effects of applied normal force on the geometry and depth of the scratches were studied. This study shows that there is a critical tip force to remove material from various surfaces.
Online publication date: Fri, 02-Jul-2010
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