A new method for production of nanoscale structures for possible applications in security Online publication date: Tue, 01-May-2007
by W. Kandulski, A. Kosiorek, M. Olek, M. Giersig
International Journal of Nanotechnology (IJNT), Vol. 4, No. 3, 2007
Abstract: In this paper, we describe two different methods for decreasing the interparticle apertures in lithographic masks prepared by the self-assembly of polystyrene (PS) latex spheres. Such a modification is highly valuable for production of ultra-small islands by nanosphere lithography (NSL), or shadow nanosphere lithography (SNSL). The first method uses the overgrowth of SiO2 shells on the surface of PS. The second method uses heating of the PS latex mask near the melting point of polystyrene, causing the spheres to gradually melt together. Both techniques lead to a controlled, time dependent decrease of the aperture sizes in the mask.
Online publication date: Tue, 01-May-2007
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Nanotechnology (IJNT):
Login with your Inderscience username and password:
Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.
If you still need assistance, please email firstname.lastname@example.org