Photoelectrochemical activity of magnetron sputtered ZnO thin films: role of thermal annealing Online publication date: Wed, 27-Jul-2022
by M.R. Almamari; N.M. Ahmed; A.M. Holi; F.K. Yam; A.A. Al-Zahrani; M.A. Almessiere
International Journal of Nanotechnology (IJNT), Vol. 19, No. 2/3/4/5, 2022
Abstract: In this paper, the effect of annealing temperature on the properties of ZnO thin films (ZOTFs) obtained using the well-known RF magnetron sputtering technique was investigated using their photoresponse in a photoelectrochemical cell. Properties pertaining to morphology, composition, structure, and optical were examined by field emission scanning electron microscopy (FESEM), energy-dispersive X-ray spectrometer (EDX), X-ray diffraction (XRD), and ultraviolet-visible spectroscopy (UV-vis), respectively. Results from FESEM showed that the surface of the ZOTFs nanoparticles was very compact, with grain size 63.32 nm at 400°C. When compared to other temperatures, 400°C contributes to a wide surface area resulting in a significantly enhanced PEC response. The ZOTF which was prepared under 400°C of annealing temperature, exhibited the highest photocurrent density 0.034 mA cm-2 and photoconversion efficiency (0.026%).
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