Title: Fabrication of 3-stepped spiral trench with smooth sidewall at nano-level to deposit superconducting material for energy storage

Authors: Minoru Sasaki; Che-Wei Hsu; Yasuhiro Suzuki; Tatsumi Hioki; Joo-hyong Noh; Osamu Takai; Hideo Watanabe; Hideyuki Doy; Tomoyoshi Motohiro

Addresses: Toyota Technological Institute, 2-12-1 Hisakata, Tenpaku-ku, Nagoya 468-8511, Japan ' Toyota Technological Institute, 2-12-1 Hisakata, Tenpaku-ku, Nagoya 468-8511, Japan ' Nagoya University, 1 Furocho, Chikusa-ku, Nagoya 464-0814, Japan ' Nagoya University, 1 Furocho, Chikusa-ku, Nagoya 464-0814, Japan ' Kanto Gakuin University, 1162-2 Ogikubo, Odawara, Knagawa 250-0042, Japan ' Kanto Gakuin University, 1162-2 Ogikubo, Odawara, Knagawa 250-0042, Japan ' D-process Inc., 2-8-22 Yamato Minami, Yamato, Kanagawa 242-0016, Japan ' D-process Inc., 2-8-22 Yamato Minami, Yamato, Kanagawa 242-0016, Japan ' Nagoya University, 1 Furocho, Chikusa-ku, Nagoya 464-0814, Japan

Abstract: Fabrication techniques consisting of patterning imbedded masks, Si etching, and smoothing treatment for realising 3-stepped spiral trench with smooth sidewall is described. This trench is subsequently filled with the superconducting material of the sputter-deposited NbN and the electroplated Cu. After polishing, the trench space becomes the coil for the superconducting magnetic energy storage. The important points of the trench quality are the certain connection between two coil ends, and the smooth sidewall at nano-level. Both demanded performances are met with the fail-safe designing and processing.

Keywords: micro/nano fabrication technique; 3-stepped trench; long spiral trench; deep reactive ion etching of Si; removing scallop; smooth sidewall; NbN deposition; superconducting magnetic energy storage.

DOI: 10.1504/IJNT.2018.099927

International Journal of Nanotechnology, 2018 Vol.15 No.11/12, pp.858 - 872

Available online: 23 May 2019 *

Full-text access for editors Access for subscribers Purchase this article Comment on this article