Authors: Sam Lowrey; Richard Blaikie
Addresses: MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Physics, University of Otago, 730 Cumberland St., Dunedin, 9054, New Zealand ' MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Physics, University of Otago, 730 Cumberland St., Dunedin, 9054, New Zealand
Abstract: A new prism design has been fabricated and tested experimentally for solid immersion optical lithography of high aspect ratio structures in the ultra high-NA regime using dielectric resonant underlayers. Such a prism design has been made possible through past work that investigated ultra high-NA imaging in the absence of high-force, intimate contact between the sample and solid-immersion medium; key to this is the use of a close index matched prism/IML combination. The work presented here demonstrates the use of a novel prism design for patterning both low and high aspect ratio structures in the ultra high-NA regime; robust and repeatable imaging with such a new prism design is now possible as the prism is not subjected to the large mechanical pressure associated with ultra-fine gap control in dry solid-immersion lithography. The prism presented here allows fabrication for ~58 nm half-pitch line structures over large exposure areas using a 405 nm wavelength exposure.
Keywords: optical lithography; solid immersion; evanescent wave lithography.
International Journal of Nanotechnology, 2018 Vol.15 No.8/9/10, pp.714 - 720
Available online: 13 Mar 2019 *Full-text access for editors Access for subscribers Purchase this article Comment on this article