Title: The influence of pre-treatment of poly(ethylene terephthalate) on its barrier properties base on ALD Al₂O₃

Authors: Ming Fang; Lizhen Yang; Wenwen Lei; Lijun Sang; Zhongwei Liu; Qiang Chen

Addresses: Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, 102600 Beijing, China ' Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, 102600 Beijing, China ' Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, 102600 Beijing, China ' Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, 102600 Beijing, China ' Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, 102600 Beijing, China ' Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, 102600 Beijing, China

Abstract: Atomic layer deposition (ALD) is a type of chemical vapour deposition (CVD), except the alternative purging precursor and oxidant/reductant, which react in self-limiting mode to grow the desired products in a binary reaction cycle. Owing to the two sequential half-reactions, the film growth in ALD technique is dense and compounds control. In this work, we employ thermal ALD (T-ALD) to grow Al₂O₃ on pre-treated poly(ethylene terephthalate) (PET) surface with the purpose of improvement of the barrier properties. The different interfacial species are obtained by a variety of pre-treatments with -COOH, -NH₃, -OH, -CO- and -COOH as well as SiCHO groups on surfaces. We find that O₂ plasma treatment can lead to the nucleation particles of Al₂O₃ that are relatively dense and small on PET, which is believed to promote Al₂O₃growth in pinhole-free mode and provide better barrier properties.

Keywords: ALD Al₂O₃; PET pre-treatment; barrier properties.

DOI: 10.1504/IJNT.2018.098429

International Journal of Nanotechnology, 2018 Vol.15 No.8/9/10, pp.647 - 654

Published online: 22 Mar 2019 *

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