Title: Modelling and application of particle distribution for atmospheric plasma excitation

Authors: Jiangbo Chen; Bing Li; Jufan Zhang

Addresses: School of Mechanical Engineering and Automation, Harbin Institute of Technology Shenzhen Graduate School, Shenzhen, 518055, China ' School of Mechanical Engineering and Automation, Harbin Institute of Technology Shenzhen Graduate School, Shenzhen, 518055, China ' School of Mechanical Engineering and Automation, Harbin Institute of Technology Shenzhen Graduate School, Shenzhen, 518055, China

Abstract: Atmospheric plasma polishing achieves removal of material by chemical reaction between gaseous active atoms and surface atom. The mechanism of etching - deposition competition exists on the gas-solid interface. Mechanism and control method of the deposition effect are analysed. Dominant elementary reactions list of mixtures of CF4/O2/He excitation is established. The conversion coefficients of reaction rate under atmospheric pressure are calculated, and the variation trends in concentrations of dominant particles components in the plasma jet are analysed by simulating. Then, the production trends of residual sedimentary particles under situation of different flow ratio are obtained. The results of theoretical simulations are used to predict the reasonable range of values of critical process parameters. Experimental verification is completed.

Keywords: atmosphere plasma excitation; atmospheric plasma polishing; deposition; process optimisation; particle distribution; elementary reaction; surface roughness; surface quality; material removal rate; MRR; theoretical modelling; plasma jet; simulation; process parameters.

DOI: 10.1504/IJNM.2017.082410

International Journal of Nanomanufacturing, 2017 Vol.13 No.1, pp.43 - 56

Received: 05 Nov 2015
Accepted: 29 Dec 2015

Published online: 16 Feb 2017 *

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