Article: Magnetorheological finishing with tangential magnetic fields formed by the rotation of a magnetic pole Journal: International Journal of Abrasive Technology (IJAT) 2016 Vol.7 No.4 pp.307 - 320 Abstract: Based on the magnetorheological (MR) effect, this research proposes a kind of magnetorheological finishing (MRF) in tangential magnetic fields formed by the rotation of magnetic poles in order to achieved realtime adjustment of MR polishing pads. In this paper, monocrystalline silicon was utilised to investigate the plane polishing characteristics based on the magnetorheology in single-point dynamic magnetic fields under different process conditions. Results showed that favourable polishing effects were obtained when silicon carbide abrasive was used to polish the workpieces for 50 to 70 min with the tangential magnetic fields being 5 mm and the machining gap being 1.1 mm. Afterwards, strontium titanate ceramic substrate, monocrystalline silicon and monocrystal 6H-SiC were polished for 50 min using this technology. It was found that the surface roughness Ra of this three materials were reduced from 0.45 to 0.11 µm, from 400 to 7 nm and from 70 to 9 nm, respectively. Inderscience Publishers - linking academia, business and industry through research

Title: Magnetorheological finishing with tangential magnetic fields formed by the rotation of a magnetic pole

Authors: Peng Yu; Jisheng Pan; Qiusheng Yan

Addresses: School of Electromechanical Engineering, Guangdong University of Technology, 510006 Guangzhou, China ' School of Electromechanical Engineering, Guangdong University of Technology, 510006 Guangzhou, China ' School of Electromechanical Engineering, Guangdong University of Technology, 510006 Guangzhou, China

Abstract: Based on the magnetorheological (MR) effect, this research proposes a kind of magnetorheological finishing (MRF) in tangential magnetic fields formed by the rotation of magnetic poles in order to achieved realtime adjustment of MR polishing pads. In this paper, monocrystalline silicon was utilised to investigate the plane polishing characteristics based on the magnetorheology in single-point dynamic magnetic fields under different process conditions. Results showed that favourable polishing effects were obtained when silicon carbide abrasive was used to polish the workpieces for 50 to 70 min with the tangential magnetic fields being 5 mm and the machining gap being 1.1 mm. Afterwards, strontium titanate ceramic substrate, monocrystalline silicon and monocrystal 6H-SiC were polished for 50 min using this technology. It was found that the surface roughness Ra of this three materials were reduced from 0.45 to 0.11 µm, from 400 to 7 nm and from 70 to 9 nm, respectively.

Keywords: dynamic magnetic fields; magnetorheological finishing; MRF; surface roughness; material removal rate; MRR; monocrystalline silicon; strontium titanate; surface quality; tangential magnetic fields; magnetic pole rotation; polishing pads; polishing pad adjustment; silicon carbide abrasive.

DOI: 10.1504/IJAT.2016.10002377

International Journal of Abrasive Technology, 2016 Vol.7 No.4, pp.307 - 320

Received: 21 May 2016
Accepted: 18 Jul 2016
Published online: 05 Jan 2017 *

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Title: Magnetorheological finishing with tangential magnetic fields formed by the rotation of a magnetic pole

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