Title: Photoluminescence spectroscopy study of excited states in InxGa1−xAs-capped InAs quantum dots

Authors: Nam-Kyu Park; Eui-Tae Kim

Addresses: Department of Materials Science and Engineering, Chungnam National University, 220 Gung-dong, Daejeon 305-764, Korea ' Department of Materials Science and Engineering, Chungnam National University, 220 Gung-dong, Daejeon 305-764, Korea

Abstract: This study reports on photoluminescence (PL) and PL excitation (PLE) spectroscopy studies of excited state transitions in InxGa1−xAs-capped InAs quantum dots (QDs). InAs self-assembled QDs were grown on GaAs (001) wafers using 2.5 mono layer (ML) InAs deposition via molecular beam epitaxy. GaAs-capped QDs showed PL peak position at 1.182 µm at 78 K with a narrow full width at half maximum of 23 meV, indicating a highly uniform QD ensemble. The PLE spectrum of GaAs-capped QDs showed four peaks related to the QD excited state transitions at 1.117, 1.140, 1.192 and 1.224 eV at 8K. Both ground state and excited state interband transitions were red-shifted when the first 30 ML of GaAs capping layer were replaced by InxGa1−xAs layer. The PL peak of In0.2Ga0.8As-capped QDs reached 1.246 µm (1.335 µm) at 78K (296K). Energy differences between the excited and ground states became smaller with increasing In composition of the InxGa1−xAs capping layers because of increasingly lower InAs to InxGa1−xAs band edge discontinuity as a result of the chemical and strain relieving effects. In addition, PLE spectra clearly showed wetting layer and quantum well states caused by the InxGa1−xAs capping layer for GaAs- and InxGa1−xAs-capped QDs, respectively. Based on the current PL, PLE, and the calculated transition energies available in literature, the lowest electron state levels of ∼60 meV and ∼112 meV above the electron ground state and the lowest hole state levels of ∼23 meV and ∼55 meV above the hole ground state were extracted.

Keywords: quantum dots; photoluminescence; InAs; MBE; molecular beam epitaxy; PLE; PL excitation; nanotechnology.

DOI: 10.1504/IJNT.2013.054213

International Journal of Nanotechnology, 2013 Vol.10 No.8/9, pp.726 - 734

Available online: 30 May 2013 *

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