Title: 213 nm pitch standards fabricated using atomic lithography

Authors: Yan Ma; Weigang Gong; Wanjing Zhang; Tongbao Li

Addresses: Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Department of Physics, Tongji University, Shanghai, 20092, China. ' Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Department of Physics, Tongji University, Shanghai, 20092, China. ' Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Department of Physics, Tongji University, Shanghai, 20092, China. ' Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Department of Physics, Tongji University, Shanghai, 20092, China

Abstract: Atomic lithography is a technique in which nearly resonant light is used to pattern an atom beam periodically. In this article, a 425 nm laser light standing wave is used to focus a beam of chromium atoms to fabricate the period of the nanoscale pitch standards of 213 ± 0.1 nm. The height was 4 nm. The (FWHM) width is 64 ± 6 nm. And this result will be analysed theoretically. The tracing of atoms is numerical simulated based on particle-optics and the factors of affecting deposition result will be found in this article.

Keywords: nanopitch standards; atomic lithography; cooled atoms; nanoscale pitch standards; nanotechnology; atom tracing; numerical simulation; particle optics.

DOI: 10.1504/IJNM.2012.048587

International Journal of Nanomanufacturing, 2012 Vol.8 No.4, pp.348 - 356

Received: 15 Oct 2011
Accepted: 26 Mar 2012

Published online: 17 Aug 2012 *

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