Title: Nanometrology at PTB in support of process control of nanoscale features in semiconductor manufacturing

Authors: Bernd Bodermann; Frank Scholze; Jens Flügge; Hermann Gross; Harald Bosse

Addresses: Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116, Braunschweig, Germany. ' Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116, Braunschweig, Germany. ' Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116, Braunschweig, Germany. ' Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116, Braunschweig, Germany. ' Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116, Braunschweig, Germany

Abstract: We report on recent developments at the PTB in the field of dimensional nanometrology with a special focus on instrumentation, measurement and simulation methods, and standards which are used in semiconductor lithography manufacturing processes. Important dimensional measurands to be controlled precisely during the high volume manufacturing processes of nanoscale features (< 32 nm node) are the positions and widths of features on lithographic masks and wafers as well as the relative positioning or overlay of features.

Keywords: semiconductor manufacturing; CD metrology; pattern placement metrology; scatterometry; high resolution microscopy; signal modelling; straightness metrology; dimensional nanometrology; process control; nanotechnology; lithography.

DOI: 10.1504/IJNM.2012.044651

International Journal of Nanomanufacturing, 2012 Vol.8 No.1/2, pp.4 - 22

Available online: 01 Jan 2012 *

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