Title: Preparation and mechanical property test on Cu/Cr bilayer film

Authors: Chun Li, Shuaihua Shang, Ping Yang, Liqiang Zhang, Liang Qi

Addresses: Laboratory of Advanced Design, Manufacturing and Reliability for MEMS/NEMS/ODES, School of Mechanical Engineering, Jiangsu University, Zhenjiang 212013, P.R. China. ' Laboratory of Advanced Design, Manufacturing and Reliability for MEMS/NEMS/ODES, School of Mechanical Engineering, Jiangsu University, Zhenjiang 212013, P.R. China. ' Laboratory of Advanced Design, Manufacturing and Reliability for MEMS/NEMS/ODES, School of Mechanical Engineering, Jiangsu University, Zhenjiang 212013, P.R. China. ' Laboratory of Advanced Design, Manufacturing and Reliability for MEMS/NEMS/ODES, School of Mechanical Engineering, Jiangsu University, Zhenjiang 212013, P.R. China. ' Laboratory of Advanced Design, Manufacturing and Reliability for MEMS/NEMS/ODES, School of Mechanical Engineering, Jiangsu University, Zhenjiang 212013, P.R. China

Abstract: The Cu/Cr bilayer film was deposited by RF magnetron sputtering. The elastic modulus and the hardness of the bilayer film were tested by using nanoindenter. The results show that the elastic modulus and the hardness of the bilayer film are different at the difference maximum depth h_max. In the meantime, the result shows the elastic modulus and the hardness of the bilayer film are lower than both of the Cr film and the Cu film. But the hardness is closer to the Cu film. It shows the Cu film has a great influence on the hardness of the Cu/Cr bilayer film.

Keywords: copper; chromium; cu-cr bilayer films; preparation; nanoindentation; elastic modulus; hardness; mechanical properties testing; nanotechnology.

DOI: 10.1504/IJMSI.2010.032492

International Journal of Materials and Structural Integrity, 2010 Vol.4 No.1, pp.25 - 34

Published online: 04 Apr 2010 *

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