Authors: Alper Yildirim, Melik Dolen
Addresses: Arcelik Corporation, Karaagac Cad. 2-6, Sutluce 34445, Istanbul, Turkey. ' Department of Mechanical Engineering, Middle East Technical University, Inonu Bulvari 06531, Ankara, Turkey
Abstract: This paper introduces a new process simulator for micro-electro-mechanical systems. The open-source program, which has been developed via C/C+ + language along with the OpenGL library functions, significantly speeds up the design phase by providing realistic outcomes about the micro-fabrication processes involved. While anisotropic/isotropic etching of silicon wafers are of major interest, the developed software can conveniently simulate additive micro-fabrication processes such as doping and material deposition by extending its basic cellular automaton algorithm. Equipped with an integrated mask design editor, complex mask patterns can be generated by the software. Consequently, the simulation on the subsequent micro-fabrication processes that employ these complex mask patterns can be carried out in the same integrated environment. The paper also shows that the simulation results are in agreement with the experimental ones both qualitatively and quantitatively.
Keywords: wet etching; anisotropic etching; doping; cellular automata; microfabrication simulation; material deposition; isotropic etching; dry etching; deep reactive ion etching; microelectromechanical systems; MEMS design; open source software.
International Journal of Design Engineering, 2008 Vol.1 No.4, pp.360 - 379
Published online: 30 Apr 2009 *Full-text access for editors Access for subscribers Purchase this article Comment on this article