Title: Application of arc discharge to increase quality of received nanofilms
Authors: V.I. Margolin
Addresses: Department of Microradioelectronics and Radio Technology (MIT), Saint Petersburg Electrotechnical University 'LETI' (ETU), Saint Petersburg, 197376, Russia
Abstract: The subject of this consideration is the arc evaporator that allows applying thin-film coatings, including nanoscale ones, by excluding the drop phase from the flow of the applied material. The plasma torch is formed with the help of the focusing coil, which is directed along the axis of the system. The plasma torch contains both ions of the atomised substance and its droplets. The special flap placed on the axis of the arc evaporator eliminates the flow of the sprayed substance from straight-flying drops, and at least one other flap installed inside the body of the focusing coil eliminates drops flying at an angle from the cathode.
Keywords: magnetron sputtering; arc magnetron evaporator; nanofilms.
International Journal of Nanotechnology, 2021 Vol.18 No.9/10, pp.840 - 846
Published online: 13 Oct 2021 *
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