Title: Geometric interpretation of the increase in the number of photons using ultra-thin films

Authors: Myung Sik Choi; Byeongdeok Lee; Sangwoo Kim; Changhyun Jin

Addresses: Department of Nano and Advanced Materials Science and Engineering, Kyungpook National University, Sangju 37224, South Korea ' Materials Science and Chemical Engineering Center, Institute for Advanced Engineering, Yongin-si 175-28, South Korea ' Materials-Supply Chain R&D Department, Korea Institute of Industrial Technology, Incheon 21999, South Korea ' Department of Materials Science and Engineering, Yonsei University, Seoul, 03722, South Korea

Abstract: Until now, surface treatment methods have been subject to many restrictions because each material has different properties. In addition, the effect of surface treatment has been approached qualitatively rather than quantitatively. This study demonstrates the remarkable improvement in the optical intensity of a matrix upon depositing an ultra-thin film layer, regardless of the morphology, dimension, type, and size. Thus, a new optical energy amplification mechanism, in which the number of photons can be increased, is proposed using a geometrical approach. In particular, the flame chemical vapour deposition used here was achieved within seconds. Moreover, based on the purpose of the process, the reduction of the metal oxide and the deposition of the amorphous carbon could be easily controlled. The powerful optical results were investigated for various material surfaces such as Au-SnO₂ nanowires, porous Si substrates, and Al₂O₃ substrates.

Keywords: thin film; photon; amorphous carbon; flame chemical vapour deposition.

DOI: 10.1504/IJSURFSE.2025.149463

International Journal of Surface Science and Engineering, 2025 Vol.19 No.4, pp.332 - 343

Received: 25 Feb 2025
Accepted: 03 May 2025
Published online: 01 Nov 2025 *

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