Int. J. of Nanomanufacturing   »   2014 Vol.10, No.5/6

 

 

Title: Molecular dynamics modelling of water nanodroplet impingement on silicon dioxide and silicon nitride substrates

 

Authors: Salil Desai; Ravindra D. Kaware

 

Addresses:
Department of Industrial & Systems Engineering, North Carolina A&T State University, 423 McNair Hall, 1601 E. Market Street, Greensboro, NC 27411, USA
2301 R Street, Auburn, NE 68305, USA

 

Abstract: This paper reports the study of a droplet-based scalable micro/nanomanufacturing process using molecular dynamics (MD) modelling. The objective of the study is to understand the nanodroplet impingement and spreading mechanism on silicon dioxide (SiO2) and silicon nitride (Si3N4) substrates with different impingement velocities. The dependence of dynamic contact angle on the initial droplet velocity was investigated for hydrophilic and hydrophobic substrate interactions. Higher rebound effect and thereby slower wetting rates were observed for the SiO2-water system as compared to the Si3N4-water system for the same magnitudes of impingement velocities. The MD simulation results were validated using the molecular kinetic theory. Findings of this research are expected to establish the required process controls in droplet-based scalable nanomanufacturing for precision deposition of nanoscale features.

 

Keywords: molecular dynamics; direct-write technology; nanodroplet impingement; substrate wetting; nanomanufacturing; nanodroplets; nanotechnology; modelling; silicon dioxide substrates; silicon nitride substrates; SiO2; SiN4; process control; precision deposition.

 

DOI: 10.1504/IJNM.2014.066281

 

Int. J. of Nanomanufacturing, 2014 Vol.10, No.5/6, pp.432 - 452

 

Available online: 11 Dec 2014

 

 

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