Int. J. of Nanomanufacturing   »   2012 Vol.8, No.4



Title: Advances, challenges and trends in growing quantum dot arrays on patterned substrates


Authors: Hongbo Lan; Yucheng Ding


School of Mechanical Engineering, Qingdao Technological University, Qingdao 266033, China.
State Key Laboratory for Manufacturing System Engineering, Xi'an Jiaotong University, Xi'an 710049, China


Abstract: The regrowth on patterned substrates has been proved as the most straightforward approach to effectively control the size, density and position of QDs to obtain highly uniform and ordering QD arrays and precise controlling and positioning for individual QD nucleation. This paper presents a comprehensive review of recent advances in fabricating QD arrays on patterned substrates. Furthermore, the challenges and trends of making high quality QD arrays using the patterned substrates are also addressed and discussed. As a result, the combination of the soft UV-NIL and MOCVD may provide a promising method of forming large-area, site-controlled, highly uniform and ordered arrays of quantum dots with low-cost and high throughput. The combination of stacking of self-assembled QDs on the patterned substrates without introducing significant defects and contaminants and optimising the growth process may be a promising pathway to obtain the highly uniform and ordering QD arrays with high optical properties.


Keywords: quantum dot arrays; uniformity; ordering; site control; patterned substrates; nanomanufacturing; nanotechnology; QD arrays; nucleation; self-assembly; quantum dots.


DOI: 10.1504/IJNM.2012.048579


Int. J. of Nanomanufacturing, 2012 Vol.8, No.4, pp.278 - 293


Submission date: 04 Dec 2011
Date of acceptance: 18 Jan 2012
Available online: 17 Aug 2012



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