Molecular dynamics modelling of water nanodroplet impingement on silicon dioxide and silicon nitride substrates
by Salil Desai; Ravindra D. Kaware
International Journal of Nanomanufacturing (IJNM), Vol. 10, No. 5/6, 2014

Abstract: This paper reports the study of a droplet-based scalable micro/nanomanufacturing process using molecular dynamics (MD) modelling. The objective of the study is to understand the nanodroplet impingement and spreading mechanism on silicon dioxide (SiO₂) and silicon nitride (Si₃N₄) substrates with different impingement velocities. The dependence of dynamic contact angle on the initial droplet velocity was investigated for hydrophilic and hydrophobic substrate interactions. Higher rebound effect and thereby slower wetting rates were observed for the SiO₂-water system as compared to the Si₃N₄-water system for the same magnitudes of impingement velocities. The MD simulation results were validated using the molecular kinetic theory. Findings of this research are expected to establish the required process controls in droplet-based scalable nanomanufacturing for precision deposition of nanoscale features.

Online publication date: Sat, 20-Dec-2014

The full text of this article is only available to individual subscribers or to users at subscribing institutions.

 
Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.

Pay per view:
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.

Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Nanomanufacturing (IJNM):
Login with your Inderscience username and password:

Username:        Password:          Forgotten your password?

Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.

If you still need assistance, please email subs@inderscience.com