Deposition and characterisation of titanium dioxide films formed by electrophoretic deposition
by Monishka Rita Narayan; Atul Raturi
International Journal of Materials Engineering Innovation (IJMATEI), Vol. 3, No. 1, 2012

Abstract: Nanocrystalline titanium dioxide (TiO2) films were deposited on glass substrates by electrophoretic deposition (EPD). Films were grown using the constant current and constant voltage methods and key EPD parameters were investigated. Anatase TiO2 powder, dissolved in deionised water with iodine and acetylacetone as dispersing agents was the colloidal suspension utilised. TiO2 particle concentration of 1 gl1 and films annealed at 100

Online publication date: Sat, 23-Aug-2014

The full text of this article is only available to individual subscribers or to users at subscribing institutions.

Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.

Pay per view:
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.

Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Materials Engineering Innovation (IJMATEI):
Login with your Inderscience username and password:

    Username:        Password:         

Forgotten your password?

Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.

If you still need assistance, please email