Title: Design and analysis of a single-flexure parallelogram mechanism-based X-Y nanopositioning stage

Authors: S.N. Vithun; Prakash Vinod; T. Narendra Reddy; P.V. Shashi Kumar

Addresses: Nano Manufacturing Technology Centre Department, Central Manufacturing Technology Institute, Tumkur Road, Bangalore – 560022, India ' Nano Manufacturing Technology Centre Department, Central Manufacturing Technology Institute, Tumkur Road, Bangalore – 560022, India ' Nano Manufacturing Technology Centre Department, Central Manufacturing Technology Institute, Tumkur Road, Bangalore – 560022, India ' Nano Manufacturing Technology Centre Department, Central Manufacturing Technology Institute, Tumkur Road, Bangalore – 560022, India

Abstract: This paper presents the design and analysis of a flexure-based X-Y direction translational nanopositioning stage. Mechanism used in this present design has a circular flexure only on the drive end of the mechanism unlike the conventional compliance mechanism, providing advantage of both minimum parasitic motion and also higher bandwidth. Theoretical calculations are carried out to evaluate range and stiffness of the mechanism and further the designed flexure mechanism is analysed for dynamic and static behaviour of mechanism using FEA. Experiments conducted demonstrate that the design has a low cross-coupling of 0.2% of total motion, and a travelling range of 114 × 114 µm. However the mechanism is capable of moving upto 657 µm, which will be tested in our future work.

Keywords: flexure mechanisms; parallel kinematic; nanopositioning stage; finite element analysis; FEA; mechanism design; parallelogram mechanism.

DOI: 10.1504/IJMMS.2016.075403

International Journal of Mechatronics and Manufacturing Systems, 2016 Vol.9 No.1, pp.24 - 35

Received: 12 May 2015
Accepted: 03 Oct 2015

Published online: 19 Mar 2016 *

Full-text access for editors Access for subscribers Purchase this article Comment on this article