Title: Experimental investigation on the growth rate of Cu nano-thin films by DC and RF magnetron sputtering methods

Authors: Liqiang Zhang; Chaoyan Xu; Yunqing Tang

Addresses: Laboratory of Span-Scale Design and Manufacturing for MEMS/NEMS/OEDS, School of Mechanical Engineering, Jiangsu University, Zhenjiang, 212013, China ' School of Mechanical Engineering, Jiangsu University, Zhenjiang, 212013, China ' Laboratory of Advanced Manufacturing and Reliability for MEMS/NEMS/OEDS, School of Mechanical Engineering, Jiangsu University, Zhenjiang, 212013, China

Abstract: The growth rate of the Cu nano-thin film was investigated based on the magnetron sputtering method under different process parameters and different sputtering method. Firstly, some samples of Cu nano-thin films were sputtered on the glass substrate by changing different sputtering power at the direct current (DC) magnetron sputtering method. Secondly, some Cu nano-thin film samples were prepared by using the DC magnetron sputtering method and radio frequency (RF) magnetron sputtering methods. The thickness of the Cu nano-thin film was test by the film thickness gauge, and then the growth rate of the Cu nano-thin film was obtained. These results show that the sputtering power is very important for the growth rate. The growth rate of the Cu nano-thin film increases with the increase of the sputtering power at the DC magnetron sputtering method; the growth rate of the Cu nano-thin film prepared under the DC magnetron sputtering method is about ten times of that prepared under the RF magnetron sputtering method.

Keywords: copper thin films; nano-thin films; experimental preparation; growth rate; magnetron sputtering; nanotechnology; film thickness; sputtering power; nanomaterials.

DOI: 10.1504/IJMSI.2014.067117

International Journal of Materials and Structural Integrity, 2014 Vol.8 No.4, pp.303 - 309

Published online: 31 Jan 2015 *

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