Title: Research on new float polishing technique with the magnetic compound fluid

Authors: Y. Zheng, K. Shimada, Y. Matsuo, K. Yamamoto

Addresses: Fukushima University, 1 Kanayagawa, Fukushima 960-1296, Japan. ' Fukushima University, 1 Kanayagawa, Fukushima 960-1296, Japan. ' Kosai Plant, FDK Co. Ltd., 2281 Washizu, Kosai 431-0495, Japan. ' Kosai Plant, FDK Co. Ltd., 2281 Washizu, Kosai 431-0495, Japan

Abstract: This paper is a continuation of a previous paper. The report demonstrates the various possibilities of float polishing utilising the present improved Magnetic Compound Fluid (MCF). The MCF developed by K. Shimada, in 2001, was improved by the addition of α-cellulose, thereby achieving a clearance as great as 8 mm as given in another paper. This paper describes the possibility of the application of the MCF float polishing technique with α-cellulose. Firstly, the results obtained under various polishing conditions of the MCF float polishing technique are described. Secondly, many applications of proposed MCF float polishing technique are described. Finally, through experiments, we confirm that the proposed technique is very useful in the polishing field, especially, to polish some three-dimensional complex shapes. [Received 18 April 2007; Accepted 28 June 2007]

Keywords: manufacturing; processing; surface treatment; magnetic compound fluid; MCF; magnetic cluster; float polishing.

DOI: 10.1504/IJCMSSE.2007.017253

International Journal of Computational Materials Science and Surface Engineering, 2007 Vol.1 No.5, pp.594 - 606

Published online: 21 Feb 2008 *

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