Effect of annealing on the physical properties of WO3 thin films
by M. Bujji Babu; D. Divya Dixit; K.V. Madhuri
International Journal of Nano and Biomaterials (IJNBM), Vol. 7, No. 1, 2017

Abstract: Tungsten trioxide (WO3) thin films were deposited by electron beam evaporation technique at an oxygen partial pressure of 2 × 10−4 mbar and at different substrate temperatures ranging from room temperature (RT) to 450°C. The films were annealed at 400°C about 2 hours and the properties were studied systematically. The x-ray diffraction studies show the diffraction peak of (320) at 2θ = 44.07° which indicate the orthorhombic phase of WO3 and also the other peaks represent the hexagonal phase of WO3. Due to annealing of the films, the monoclinic phase is also observed. The surface morphology of WO3 thin films was investigated by using atomic force microscopy and scanning electron microscopy, which supports the above data. The energy-dispersive x-ray (EDX) compositional analysis confirmed the presence of W and O. The optical properties were studied by UV-VIS spectrophotometer and hence the bandgap values are calculated.

Online publication date: Wed, 17-Jan-2018

The full text of this article is only available to individual subscribers or to users at subscribing institutions.

Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.

Pay per view:
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.

Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Nano and Biomaterials (IJNBM):
Login with your Inderscience username and password:

    Username:        Password:         

Forgotten your password?

Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.

If you still need assistance, please email subs@inderscience.com