Amorphous layers by electron beam evaporator deposition for hetero-junction with intrinsic thin layer solar cells applications Online publication date: Mon, 22-Aug-2016
by Sally Liu; Zhi-Yu Chen; Shu-Tong Chang; Min-Hung Lee
International Journal of Nanotechnology (IJNT), Vol. 13, No. 7, 2016
Abstract: A low-cost process with electron beam evaporator deposition for amorphous layers was demonstrated in hetero-junction with intrinsic thin layer (HIT) solar cell. The cleaning process with saw damage removal procedure and the annealing temperature are also discussed in this work. The open-circuit voltage (Voc) and short-circuit current density (Jsc) were obtained as 285 mV and 2.9 mA/cm², respectively, with 5 min saw damage removal and 450°C forming gas annealing. Therefore, the low-cost process with the electron beam evaporator deposition could possibly fabricate the HIT solar cell and be a candidate for future higher performance photovoltaic device with optimisation process condition.
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