Design and analysis of a single-flexure parallelogram mechanism-based X-Y nanopositioning stage
by S.N. Vithun; Prakash Vinod; T. Narendra Reddy; P.V. Shashi Kumar
International Journal of Mechatronics and Manufacturing Systems (IJMMS), Vol. 9, No. 1, 2016

Abstract: This paper presents the design and analysis of a flexure-based X-Y direction translational nanopositioning stage. Mechanism used in this present design has a circular flexure only on the drive end of the mechanism unlike the conventional compliance mechanism, providing advantage of both minimum parasitic motion and also higher bandwidth. Theoretical calculations are carried out to evaluate range and stiffness of the mechanism and further the designed flexure mechanism is analysed for dynamic and static behaviour of mechanism using FEA. Experiments conducted demonstrate that the design has a low cross-coupling of 0.2% of total motion, and a travelling range of 114 × 114 µm. However the mechanism is capable of moving upto 657 µm, which will be tested in our future work.

Online publication date: Sat, 19-Mar-2016

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