Design and analysis of a single-flexure parallelogram mechanism-based X-Y nanopositioning stage Online publication date: Sat, 19-Mar-2016
by S.N. Vithun; Prakash Vinod; T. Narendra Reddy; P.V. Shashi Kumar
International Journal of Mechatronics and Manufacturing Systems (IJMMS), Vol. 9, No. 1, 2016
Abstract: This paper presents the design and analysis of a flexure-based X-Y direction translational nanopositioning stage. Mechanism used in this present design has a circular flexure only on the drive end of the mechanism unlike the conventional compliance mechanism, providing advantage of both minimum parasitic motion and also higher bandwidth. Theoretical calculations are carried out to evaluate range and stiffness of the mechanism and further the designed flexure mechanism is analysed for dynamic and static behaviour of mechanism using FEA. Experiments conducted demonstrate that the design has a low cross-coupling of 0.2% of total motion, and a travelling range of 114 × 114 µm. However the mechanism is capable of moving upto 657 µm, which will be tested in our future work.
Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Mechatronics and Manufacturing Systems (IJMMS):
Login with your Inderscience username and password:
Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.
If you still need assistance, please email subs@inderscience.com