Local deposition using an electrostatic inkjet technique with a nanopipette for photomask repair
by Futoshi Iwata; Hiroyuki Ui
International Journal of Nanomanufacturing (IJNM), Vol. 11, No. 3/4, 2015

Abstract: We have developed local deposition techniques using a nanopipette for photomask repair. The nanopipette is a tapered glass capillary with an aperture size of sub-micrometer in diameter. The nanopipette was filled with a nanoink containing Au nano-particles with a diameter of around 3 nm. As a driving force of the ink deposition, electrostatic ink-jet method was employed. By applying a pulse voltage on an electrode inserted into the nanopipette, a Taylor cone is formed and discharged at the edge of the pipette. As a result, the droplet is deposited on the substrate. By controlling parameters of the pipette-surface distance, pulse width and applied voltage, it is possible to control the amount of deposition. The smallest size of dot with sub-micrometer in diameter is achieved with the optimised parameters. The simple deposition processing using the nanopipette can be a strong candidate of photomask repairing method for repairing size of micro to sub-micrometer scale.

Online publication date: Wed, 23-Sep-2015

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