Nano-structural and surface characteristics of non-stoichiometric In2O3−x thin films Online publication date: Sun, 30-Nov-2008
by G. Kiriakidis, M. Suchea, S. Christoulakis, K. Moschovis, T. Kitsopoulos, J. Stoemenos
International Journal of Nanotechnology (IJNT), Vol. 6, No. 1/2, 2009
Abstract: In this work we present recent results on non-stoichiometric In2O3−x thin films grown by dc magnetron sputtering technique focusing on structural and surface characterisation using cross-section transmission electron microscopy (XTEM), Atomic force Microscopy (AFM) and X-ray diffraction (XRD). The films were amorphous in the early stage of growth becoming crystalline after a critical thickness. Material structure and composition are extremely important factors for the design of high efficiency gas sensors. The control of such structural parameters as grain size, texturing, porosity and grain shape through a single growth parameter (thickness) for such nanostructured films are critical for the improvement of their gas sensitivity.
Online publication date: Sun, 30-Nov-2008
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