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Characteristics and hot-carrier effects of strained pMOSFETs with SiGe channel and embedded SiGe source/drain stressors
Mu-Chun Wang; Shea-Jue Wang; Heng-Sheng Huang; Shuang-Yuan Chen; Min-Ru Peng; Liang-Ru Ji; Ming-Feng Lu; Wen-Shiang Liao; Chuan-Hsi Liu
International Journal of Nanotechnology (IJNT), 2014 Vol.11 No.1/2/3/4, pp.62 - 74
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