Title: A new float-polishing technique with large clearance utilising magnetic compound fluid

Authors: Kunio Shimada, Yoshio Matsuo, Keita Yamamoto, Yongbo Wu

Addresses: Fukushima University, 1 Kanayagawa, Fukushima 960-1296, Japan. ' Kosai Plant, FDK Co. Ltd., 2281 Washizu, Kosai 431-0495, Japan. ' Kosai Plant, FDK Co. Ltd., 2281 Washizu, Kosai 431-0495, Japan. ' Akita Prefectural University, Aza-Ebinokuchi, Tsuchiya, Honjyo 015-0055, Japan

Abstract: This report described a new float-polishing technique with large clearance utilising a newly developed magnetic responsive fluid, Magnetic Compound Fluid (MCF) developed by one of the authors, Shimada, in 2001. Before the present study, a clearance of up to 0.1 mm had been obtained through the use of MCF in float polishing. MCF was then improved by the addition of α-cellulose. A clearance as large as 8 mm could then be achieved in float polishing. The polishing results showed a finely polished, and mirror-like surface with a nm-order Ra for various kinds of polished material was obtained. The mechanism of our proposed polishing technique was explained in terms of a magnetic cluster model by using the experimental results regarding polished surface roughness under the abrasive particles condition of the MCF. The results obtained by this polishing technique were also compared to those obtained by utilising ordinary magnetic responsive fluids, that is, Magnetic Fluid (MF) or magnetorheological fluid.

Keywords: magnetic compound fluids; MCF; magnetic cluster; float polishing; magnetic field; magnetorheological fluids; surface roughness; abrasive particles.

DOI: 10.1504/IJAT.2008.020564

International Journal of Abrasive Technology, 2008 Vol.1 No.3/4, pp.302 - 315

Available online: 30 Sep 2008 *

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