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International Journal of Materials and Product Technology (IJMPT)

International Journal of Materials and Product Technology

1996 Vol.11 No.1/2


Pages Title and author(s)
1-8Vacuum electrofurnaces with carbon-composite heat blocks
E.N. Marmer
DOI: 10.1504/IJMPT.1996.036314
9-18Physical metallurgy of the two-way shape memory effect in TiNi alloys
Peter Filip, Karel Mazanec
DOI: 10.1504/IJMPT.1996.036315
19-50Open structure design for sash sheet metal product
Zone-Ching Lin, Yung-Chuan Chang
DOI: 10.1504/IJMPT.1996.036316
51-61Simulation models for management of resource allocation and line balancing: a case study
Felix T.S. Chan
DOI: 10.1504/IJMPT.1996.036317
62-75Capacity expansion analysis in a chemical plant using linear programming
Kenneth H. Myers, Reuven R. Levary
DOI: 10.1504/IJMPT.1996.036318
76-88Strategic investment appraisal for advanced manufacturing technology
Alan Stainer, Abby Ghobadian, Jonathan Liu, Lorice Stainer
DOI: 10.1504/IJMPT.1996.036319
89-97A review of the application of expert systems to welding
A.A. Bahashwan, S.B.L. Garg
DOI: 10.1504/IJMPT.1996.036320
98-107Applying an analytical approach to shop-floor scheduling: a case study
Kerry Swinehart, Mahmoud Yasin, Eduardo Guimaraes
DOI: 10.1504/IJMPT.1996.036321
108-132Exploring the scheduling problems in a flow shop environment via simulation
Felix T.S. Chan
DOI: 10.1504/IJMPT.1996.036322
133-144Evaluation of scheduling rules in flexible manufacturing systems via simulation
Felix T.S. Chan
DOI: 10.1504/IJMPT.1996.036323
145-158Welded silicon for power electronic devices
Colin Parkes, S.J. Neil Mitchell, B. Mervyn Armstrong, Harold S. Gamble, Edmond T.G. Ling
DOI: 10.1504/IJMPT.1996.036324
159-165ODMR studies of recombination emission in MPS3 layered semiconductors and their intercalation derivatives
E. Lifshitz, A.H. Francis
DOI: 10.1504/IJMPT.1996.036325
166-177A rapid thermal processing system for the deposition of silicon carbide layers on silicon
John H. Montgomery, Fred H. Ruddell, David W. McNeill, B. Mervyn Armstrong, Harold S. Gamble
DOI: 10.1504/IJMPT.1996.036326

 

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