Physical properties of nanosized cobalt doped TiO2 films grown by pulsed laser deposition Online publication date: Tue, 09-Jan-2018
by Faouzi Hanini; Abderrahmane Bouabellou; Yassine Bouachiba; Fouad Kermiche; Adel Taabouche; Kamel Boukheddaden
International Journal of Nanoparticles (IJNP), Vol. 9, No. 3, 2017
Abstract: Ti1-x CoxO2 (x = 0−0.06) films were deposited at 450°C onto glass substrates using pulsed laser deposition method. The used source was a Nd:YAG laser (λ = 355 nm, ν = 5 Hz, Φ = 2 J/cm2 and τ = 8 ns pulse duration). Structural, morphology and optical properties of Ti1-x CoxO2 thin films were studied. X-ray diffraction (GIXRD) analysis showed that the undoped films consist of TiO2 anatase phase with preferred orientation along the [101] direction and the Co-doped TiO2 films crystallised in a rutile structure, with a strong (111) orientation in 6 at.% Co doped TiO2. Surface morphology, nanoparticles size and growth stages based on atomic force microscopy (AFM) measurements are presented and discussed. Both film thickness and refraction index dependence on the fraction of Co doping are derived from TE and TM modes excited in optical prism coupler. The deduced value of optical gap was ranged between 3.13 eV and 3.32 eV in quite good agreement with available data of literature.
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