The effect of different slurries on material removal of sapphire surface in fixed-abrasive lapping Online publication date: Tue, 05-May-2015
by Zhilan Ju; Yongwei Zhu; Jianbin Wang; Dunwen Zuo
International Journal of Machining and Machinability of Materials (IJMMM), Vol. 17, No. 1, 2015
Abstract: Softened film on the sapphire substrate exerts a great effect on the material removal rate (MRR). By studying the sapphire MRR and the softened film thickness on the surface in the chemical reaction of lapping, the material removal mechanism of sapphire is explored by fixed-abrasive lapping. In this paper, a serial of nanoindentation experiment was carried out for sapphire using four different chemical slurries, i.e., de-ionised water, ethylenediamine, triethanolamine and ethylene glycol. The softened film thickness of sapphire samples after saturated in slurries were evaluated. Although MRR was calculated using the above different slurries, the results indicate that the addition of ethylene glycol is beneficial to form the softened film. The MRR of sapphire is well in correlation with a synergetic effect of chemical slurry action and self-conditioning property of hydrophilic FA pad. That can provide processing parameters for the ductile lapping of sapphires.
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