Structural and chemical changes during the growth of Fe nanoparticles in SiO₂ under low energy ion implantation
by Jérôme Leveneur; John Kennedy; G.V.M. Williams; Masato Sasase; James B. Metson; Andreas Markwitz
International Journal of Nanotechnology (IJNT), Vol. 11, No. 5/6/7/8, 2014

Abstract: Low energy (15 keV) Fe implantation into SiO₂ (400 nm) on Si initially leads to the formation of very small Fe nanoparticles. The Fe nanoparticles grow in size and remain crystalline as the fluence is increased. At the same time there is Si and oxygen sputtering that reduces the thickness of the SiO₂ layer. It is this sputtering that leads to Fe nanoparticles that protrude from the surface for high Fe fluences of at least 5 × 10¹⁶ at.cm⁻². The surface nanoparticles develop an oxide layer when exposed to air. Fe silicides (probably FeSi₂) also occur for these high fluences. Their formation is likely to occur because sputtering leads to a Si excess near the surface.

Online publication date: Mon, 15-Dec-2014

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