TiO₂ thin films studied by FTIR, AFM and spectroscopic ellipsometry
by Y. Bouachiba; F. Hanini; A. Bouabellou; F. Kermiche; A. Taabouche; M. Bouafia; S. Amara; S. Sahli; K. Boukheddaden
International Journal of Nanoparticles (IJNP), Vol. 6, No. 2/3, 2013

Abstract: TiO₂ thins films were prepared on Si (100) substrates by a sol-gel dip coating process. Effect of the annealing temperatures in different atmospheres (air and O₂) on the properties of the films has been examined. FTIR results indicated a dominant feature centred around 438 cm⁻¹, which is characteristic of the anatase TiO₂. This peak is quite sharp at higher temperature, indicating the film is well-crystallised, especially for the film annealed at 500°C under oxygen. The bands at 3,400 and 1,620 cm⁻¹ represented the stretching and bending vibrations of O-H hydroxyl groups, and those bands could be normally reduced by the calcination process. The morphology of the films annealed at 500°C under air and oxygen showed relatively uniform surface, densely packed nanoparticles and quite low mean average roughness values. The determination of the refractive index, packing density and the band gap by the ellipsometry is presented.

Online publication date: Mon, 31-Mar-2014

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