Effect of annealing on the structural and optical properties of sputtered HfN_x thin films
by H. Gueddaoui; G. Schmerber
International Journal of Nanoparticles (IJNP), Vol. 6, No. 2/3, 2013

Abstract: HfN_x films deposited by dc reactive magnetron sputtering at 150°C were annealed for 60 minutes at 400°C under a continuous 4.5 sccm argon gas flow. The X-ray diffraction (XRD) analysis of annealed films showed the existence of hexagonal (hcp-HfN_x) and rock-salt (fcc-HfN_x) phases in the chemical composition range 0.34 ≤ × ≤ 1.25. By using the Drude-Lorentz model, good agreement was found between experimental and calculated reflectance spectra in the energy range extending from 0.5 to 6.5 eV. The annealing treatment has two main effects: the first to increase the damping factor of the conduction of free carriers for x > 1.19 with a significant change in the plasma frequency, and the second to shift the screened plasma frequency towards lower energies.

Online publication date: Mon, 31-Mar-2014

The full text of this article is only available to individual subscribers or to users at subscribing institutions.

 
Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.

Pay per view:
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.

Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Nanoparticles (IJNP):
Login with your Inderscience username and password:

Username:        Password:          Forgotten your password?

Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.

If you still need assistance, please email subs@inderscience.com