213 nm pitch standards fabricated using atomic lithography
by Yan Ma; Weigang Gong; Wanjing Zhang; Tongbao Li
International Journal of Nanomanufacturing (IJNM), Vol. 8, No. 4, 2012

Abstract: Atomic lithography is a technique in which nearly resonant light is used to pattern an atom beam periodically. In this article, a 425 nm laser light standing wave is used to focus a beam of chromium atoms to fabricate the period of the nanoscale pitch standards of 213 ± 0.1 nm. The height was 4 nm. The (FWHM) width is 64 ± 6 nm. And this result will be analysed theoretically. The tracing of atoms is numerical simulated based on particle-optics and the factors of affecting deposition result will be found in this article.

Online publication date: Thu, 21-Aug-2014

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