Fabrication and growth of GaN-based micro and nanostructures Online publication date: Mon, 06-Feb-2012
by Blandine Alloing; Emmanuel Beraudo; Yvon Cordier; Fabrice Semond; Sylvain Sergent; Olivier Tottereau; P. Vennéguès; Stéphane Vézian; Jesús Zúñiga-Pérez
International Journal of Nanotechnology (IJNT), Vol. 9, No. 3/4/5/6/7, 2012
Abstract: GaN is considered as the material of choice for electromechanical, electronic and optoelectronic applications in the visible/UV regions of the electromagnetic spectrum. However, the lack of an adapted substrate results in a very large density of defects, in particular dislocations, stacking faults and cracks. Under these circumstances, the growth of nanostructures appears as an appealing means of circumventing the problem. In this paper, we describe the fabrication and characterisation of GaN-based nanostructures cantilevers, microdiscs, photonic crystals, micro and nanowires grown by metallorganic vapour phase epitaxy (MOVPE) and molecular beam epitaxy (MBE) and fabricated either by a bottom-up or a top-down approach. The applications envisaged at CRHEA will be examined.
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