Characterisation and determination of Ni-P coating sputtering rate
by Božidar Matijević; Lidija Ćurković; Vera Rede
International Journal of Microstructure and Materials Properties (IJMMP), Vol. 6, No. 6, 2011

Abstract: Electroless nickel (EN) plating coating were prepared using hypophosphite reduced EN bath at pH 4.8-5.6 and temperature 91 ± 3°C. Density of the bath were 1.04 g/cm³ and deposition rate was 18 μm/hour for plain Ni-P coatings. It enables us to obtain a coating of nickel-phosphorus containing phosphorus at 10% level. The Ni-P coating was characterised by optical microscopy (OM), scanning electron microscopy (SEM) with energy dispersive spectroscopy (EDS) and glow discharge optical emission spectrometry (GDOES). Hardness is determined on a micro hardness tester using a 100 g load. The spattering rate of investigated coating was also determined by GDOES.

Online publication date: Mon, 19-Dec-2011

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